• Optical Imaging System for Semiconductor Wafer Analysis
  • Optical Imaging System for Semiconductor Wafer Analysis
  • Optical Imaging System for Semiconductor Wafer Analysis
  • Optical Imaging System for Semiconductor Wafer Analysis
  • Optical Imaging System for Semiconductor Wafer Analysis
  • Optical Imaging System for Semiconductor Wafer Analysis

Optical Imaging System for Semiconductor Wafer Analysis

After-sales Service: 1 Year
Warranty: 1 Year
Magnification: >1000X
Type: Video
Number of Cylinder: Binoculars
Mobility: Desktop
Samples:
US$ 125000/Piece 1 Piece(Min.Order)
| Request Sample
Customization:
Gold Member Since 2016

Suppliers with verified business licenses

  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
Overview

Basic Info.

Model NO.
LS AFM
Stereoscopic Effect
Stereoscopic Effect
Kind of Light Source
Ordinary Light
Shape
Single-lens
Usage
Teaching
Principle
Optics
Principle of Optics
Polarizing Microscope
Sample Size
Φ≤90mm,H≤20mm
Max. Scan Range
X/Y: 20 Um, Z: 2 Um
Resolution
X/Y:160;0.2 Nm, Z: 0.05nm
Scan Rate
0.6Hz~4.34Hz
Feedback Type
DSP Digital Feedback
PC Connection
USB2.0
Windows
Compatible with Windows98/2000/XP/7/8
Scan Angle
Random
Sample Movement
0~20mm
Data Points
256×256,512×512
Transport Package
Carton and Wooden
Specification
55 lbs
Trademark
flyingman
Origin
China
HS Code
9011800090
Production Capacity
100pieces/Month

Product Description


Suzhou FlyingMan Precision Instruments Co., Ltd. offers an Advanced Optical Imaging System for Semiconductor Wafer Analysis. This high-resolution microscope provides industry-leading wafer inspection and defect detection capabilities.

Product Description




Features



  • The first large-scale industrial atomic force microscope in China to achieve commercial production

  • Unlimited sample size and weight capacity, ideal for testing large samples like wafers, ultra large gratings, and optical glass

  • Sample stage with strong expandability for multi-instrument combination and in-situ detection

  • One-click automatic scanning with programming for multiple test points for fast and automated detection

  • Stationary sample scanning with XYZ 3D motion measurement imaging

  • Gantry scanning head design, marble base, vacuum adsorption stage

  • Integrated mechanical vibration damping and environmental noise shielding solutions for reduced system noise levels

  • Intelligent and fast needle insertion method for automatic detection of piezoelectric ceramics

  • Scanner nonlinear correction user editor for nano characterization and measurement accuracy better than 98%



Software



  1. Two sampling pixel options: 256×256, 512×512

  2. Execute scan area move and cut function to select any area of interest on the sample

  3. Scan sample in random angles at the beginning

  4. Real-time adjustment of the laser spot detection system

  5. Choose and set different colors for scanning images in the palette

  6. Support linear average and offset calibration in real-time for sample tilt

  7. Support scanner sensitivity calibration and electronic controller auto-calibration

  8. Support offline analysis and processing of sample images



Company Name: Suzhou FlyingMan Precision Instruments Co., Ltd.


 Optical Imaging System for Semiconductor Wafer Analysis
 
Product Parameters
Working mode Contact mode, Tapping mode Z Lifting table Stepper motor drive control with a minimum step size of 10nm
Optional mode Friction force/lateral force, amplitude/phase,magnetic force/electrostatic force Z Lifting stroke 20mm (optional 25mm)
Force spectrum curve F-Z force curve, RMS-Z curve Optical positioning 10X optical objective
XYZ Scanning method Probe driven XYZ scanning Camera 5 megapixel digital CMOS
XY Scanning Range Greater than  100um×100um Scan rate 0.6Hz~30Hz
Z Scan angle Greater than 10um Scan angle 0~360°
Scanning resolution Horizontal 0.2nm, vertical 0.05nm Operating environment Windows 10
operating system  
XY
Sample Stage
Stepper motor drive control, with a movement accuracy of 1um Communication interface USB2.0/3.0
XY
Shift motion
200×200mm(Optional 300×300mm) Instrument structure Gantry scanning head, marble base
Sample loading platform Dia 200mm(Optional 300mm) Damping method Air floating shock absorption acoustic shielding cover (optional active shock absorption platform)
Sample Weight ≤20Kg    

III. Main Technical Parameters


Founded in 2013, Suzhou FlyingMan Precision Instruments Co., Ltd. has been dedicated to producing high-quality instruments for laboratories and factories for the past 9 years.


We offer an atomic force microscope designed for both educational and wafer inspection purposes, providing the best cost ratio in the market.


 
Detailed Photos
Optical Imaging System for Semiconductor Wafer Analysis

Optical Imaging System for Semiconductor Wafer AnalysisOptical Imaging System for Semiconductor Wafer AnalysisOptical Imaging System for Semiconductor Wafer Analysis

 

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now

You Might Also Like

Gold Member Since 2016

Suppliers with verified business licenses

Export Year
2015-01-01
OEM/ODM Availability
Yes